A Collection of Images of HEBs Fabriacted using Electron Beam Lithography:

Due to the requirement for very small area, HEBs in THz mixers typically have nanoscale dimensions. Much research has been done using electron-beam lithography to define these dimensions. This method produces very precise HEB structures, and is suitable for niobium diffusion-cooled HEBs and niobium nitride phonon-cooled HEBs.

Click here for the latest RF test results for e-beam p-HEB mixers.

An SEM image of the first diffusion-cooled hot-electron bolometer (HEB) fabricated at UVa using Electron-Beam Lithography.

An SEM image of a phonon-cooled hot electron bolometer.

An SEM image of a diffusion-cooled hot electron bolometer.

Resistive transition of an HEB fabricated using electron beam lithography.

Noise temperature plots for RF operation of 585 GHz HEB mixer, fabricated with e-beam lithography.

Conversion gain for RF operation of 585 GHz HEB mixer, fabricated with e-beam lithography.

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Last Updated February 19th, 2004
For comments or questions, contact jcs4x@virginia.edu